Acid Texturization of Polysilicion for Solar Cell Applications | Original Article

ABSTRACT:

In the fabrication of polysilicion solar cell, efficiency of the solar cell is the key issue. lite have used the polysilicion wafers obtained directly from the manufacturer, which have lots of saw damages on its surface. We have removed the saw damage using HF: HNO3: H2O solution in different proportions. After saw damage removal texturization on the same wafer were carried out using the mixtures of acid solutions of HF, HNO3, H2O and H2SO4 in with different combinations. The solution preparation and texturization are the exothermic reactions. Since the process of texturization is highly sensitive for temperature, therefore, a constant temperature bath was designed and fabricated in house to carry out the reaction at constant temperature. The textured surface was analyzed by high resolution optical microscope, surface profiling and scanning electron microscope. We have achieved the reflectance of light up to 18%, while the initial hare wafers were having the reflectance of 30%. As a consequence the light reflected on the wafer is less that leads to the solar cell to utilize maximum illumination for the conversion of the optical energy into electrical energy. The micrographs and etch rate etc. were studied thoroughly and have been presented.